Group Leader/Assistant Professor: High-Harmonic Generation and EUV Physics
FOM - Foundation for Fundamental Research on Matter
The Advanced Research Center for Nanolithography (ARCNL) is looking for a tenure track group leader in the field of EUV physics and high-harmonic generation. The successful candidate will develop a world-class high-flux HHG source and employ it to perform cutting-edge science in an area related to nanolithography.
The successful candidate will establish a group that hosts expertise in HHG and coherent EUV production, and aims to advance HHG to unprecedented levels for both fundamental and applied science. Activities to develop an OPCPA-based HHG driving laser with mJ pulse energy at 50 kHz repetition rate are already ongoing at ARCNL, and the successful candidate is expected to lead this effort.
The HHG source development activities will be an important asset to the experimental capabilities at ARCNL, which already hosts groups working on photo-electron spectroscopy, interference lithography and lensless imaging with coherent EUV sources. In addition to developing a unique research programme, close collaboration with the other research groups is encouraged: in particular with those groups involved in applications of HHG, such as the EUV photoresists, EUV photoemission and the EUV generation and imaging groups.
In addition to HHG source development and (coherent) EUV generation, possible research areas may be (but are not limited to) EUV-driven ultrafast processes, EUV/soft-X-ray spectroscopy, extreme nonlinear optics, ultrafast materials science and condensed matter physics. Candidates with a strong track record in the development and application of HHG sources are especially encouraged to apply.
The Group Leader:
- Initiates a novel research programme in EUV physics with HHG sources;
- Develops and combines novel experimental techniques;
- Acquires national and international financial support to expand his/her group;
- Directs the group members and the implementation of the projects within the group;
- Is responsible for the budget, the planning and the quality of the projects within the group;
- Collaborates actively with the other research groups at ARCNL, in particular those involved in HHG applications;
- Estabilshes and maintains active collaboration with ASML research;
- Contributes actively to the positioning of the field both nationally and internationally;
- Realizes publications in leading international journals;
- Gives talks and lectures within and outside the Netherlands;
- Develops and maintains national and international relations.
- Trained and graduated in a relevant field of research;
- Postdoctoral research experience in high-harmonic generation and experiments involving coherent ultrafast EUV radiation.